Logic-level estimators of leakage currents, in nanoscale standard-cell-based designs, are relevant for the dramatic speed advantage with respect to analog SPICE-level simulation. We propose a novel logic-level leakage estimation model based on the characterization of voltages at the internal nodes of digital cells, in conjunction with the characterization of leakage currents in a single field-effect transistor (FET) device and with the input-dependent Kirchhoff current law expression of the total current in the cell topology. The voltage-based nature of the approach simplifies the inclusion of supply voltage variation/scaling impact, as well as of output voltage drop (loading effect), on leakage currents. The method has been implemented in hardware description language models of a complete cell library. Exhaustive tests report average accuracy below 1% error in 22-nm CMOS and 20-nm FinFET technologies, when compared with SPICE BSIM simulation results.
A Voltage-Based Leakage Current Calculation Scheme and its Application to Nanoscale MOSFET and FinFET Standard-Cell Designs / Abbas, Zia; Mastrandrea, Antonio; Olivieri, Mauro. - In: IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS. - ISSN 1063-8210. - (2014), pp. 1-1. [10.1109/tvlsi.2013.2294550]
A Voltage-Based Leakage Current Calculation Scheme and its Application to Nanoscale MOSFET and FinFET Standard-Cell Designs
ABBAS, ZIA;MASTRANDREA, ANTONIO;OLIVIERI, Mauro
2014
Abstract
Logic-level estimators of leakage currents, in nanoscale standard-cell-based designs, are relevant for the dramatic speed advantage with respect to analog SPICE-level simulation. We propose a novel logic-level leakage estimation model based on the characterization of voltages at the internal nodes of digital cells, in conjunction with the characterization of leakage currents in a single field-effect transistor (FET) device and with the input-dependent Kirchhoff current law expression of the total current in the cell topology. The voltage-based nature of the approach simplifies the inclusion of supply voltage variation/scaling impact, as well as of output voltage drop (loading effect), on leakage currents. The method has been implemented in hardware description language models of a complete cell library. Exhaustive tests report average accuracy below 1% error in 22-nm CMOS and 20-nm FinFET technologies, when compared with SPICE BSIM simulation results.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.