Hydrogen incorporation is shown to cause passivation of various N-related localized states and partial neutralization of N-induced changes in the electronic structure of the GaN(x)P(1-x) alloys with x < 0.008. According to the performed X-ray diffraction measurements, the hydrogenation is also found to cause strong expansion of the GaNP lattice which even changes from a tensile strain in the as-grown GaNP epilayers to a compressive strain in the post-hydrogenated structures with the highest H concentration. By comparing results obtained using two types of hydrogen treatments, i.e. by implantation from a Kaufman source and by using a remote dc H plasma, the observed changes are shown to be inherent to H due to its efficient complexing with N atoms, whereas possible effects of implantation damage are only marginal. (c) 2005 Elsevier B.V. All rights reserved.

Unusual effects of hydrogen on electronic and lattice properties of GaNP alloys / I. A., Buyanova; M., Izadifard; T., Seppanen; J., Birch; W. M., Chen; S. J., Pearton; Polimeni, Antonio; Capizzi, Mario; M. S., Brandt; C., Bihler; Y. G., Hong; C. W., Tu. - In: PHYSICA. B, CONDENSED MATTER. - ISSN 0921-4526. - 376:1(2006), pp. 568-570. (Intervento presentato al convegno 23rd International Conference on Defects in Semiconductors tenutosi a Awaji Isl, JAPAN nel JUL 24-29, 2005) [10.1016/j.physb.2005.12.143].

Unusual effects of hydrogen on electronic and lattice properties of GaNP alloys

POLIMENI, Antonio;CAPIZZI, Mario;
2006

Abstract

Hydrogen incorporation is shown to cause passivation of various N-related localized states and partial neutralization of N-induced changes in the electronic structure of the GaN(x)P(1-x) alloys with x < 0.008. According to the performed X-ray diffraction measurements, the hydrogenation is also found to cause strong expansion of the GaNP lattice which even changes from a tensile strain in the as-grown GaNP epilayers to a compressive strain in the post-hydrogenated structures with the highest H concentration. By comparing results obtained using two types of hydrogen treatments, i.e. by implantation from a Kaufman source and by using a remote dc H plasma, the observed changes are shown to be inherent to H due to its efficient complexing with N atoms, whereas possible effects of implantation damage are only marginal. (c) 2005 Elsevier B.V. All rights reserved.
2006
electronic structure; ganp; hydrogen; passivation
01 Pubblicazione su rivista::01a Articolo in rivista
Unusual effects of hydrogen on electronic and lattice properties of GaNP alloys / I. A., Buyanova; M., Izadifard; T., Seppanen; J., Birch; W. M., Chen; S. J., Pearton; Polimeni, Antonio; Capizzi, Mario; M. S., Brandt; C., Bihler; Y. G., Hong; C. W., Tu. - In: PHYSICA. B, CONDENSED MATTER. - ISSN 0921-4526. - 376:1(2006), pp. 568-570. (Intervento presentato al convegno 23rd International Conference on Defects in Semiconductors tenutosi a Awaji Isl, JAPAN nel JUL 24-29, 2005) [10.1016/j.physb.2005.12.143].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/236367
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