The use of microwave(MW) radiation to sinter metal oxide nanoparticles in plasma atmosphere has been successfully demonstrated for the production of p-type semiconductors to be utilized as photoactive materials in cathodic dye-sensitized solar cells (p-DSCs).[1] In particular, the preparation of NiO thin films[1,2] has been realized with this innovative method. In the adopted procedure NiO nanoparticles are first sprayed onto a transparent and conductive fluorine-doped indium oxide layer, and successively sintered at about 400 °C in plasma atmosphere for less than 10 mins with MW using a characteristic frequency of 2.45 GHz.[2] NiO layers with mesoporous morphology could be obtained via MW-sintering process as demonstrated by SEM and FIB images of NiO films with thickness in the range 0.6-15 µm. The electrochemical characterization of the NiO films thus prepared was conducted in aqueous and anhydrous electrolytes. The results were compared to those obtained with samples of compact NiO having comparable thickness. Successively the mesoporous NiO samples were sensitized with various organic/organometallic dyes, and tested in sealed cells with the redox couple I2/I-. The resulting p-DSCs displayed efficiencies of less than 0.2 % [3] when NiO cathode had an optimum thickness value comprised between 2 and 4 m. Studies about the photo-electrochemical behaviour of tandem DSCs based on MW-sintered NiO photocathodes and TiO2 photoanodes are in progress, and will constitute the content of another contribution.

CATHODIC DYE-SENSITIZED SOLAR CELLS WITH PHOTOACTIVE NIO ELECTRODES DEPOSITED VIA PLASMA ASSISTED MICROWAVE SINTERING / Dini, Danilo; Decker, Franco; Naponiello, GAIA CLARA MERCEDES; Dowling, Denis P.; Di Carlo, Aldo. - In: Atti del Convegno. - STAMPA. - (2013), pp. 38-38. (Intervento presentato al convegno Giornate dell'Elettrochimica Italiana 2013 tenutosi a Pavia nel 22-27 Settembre 2017).

CATHODIC DYE-SENSITIZED SOLAR CELLS WITH PHOTOACTIVE NIO ELECTRODES DEPOSITED VIA PLASMA ASSISTED MICROWAVE SINTERING

DINI, DANILO;DECKER, Franco;NAPONIELLO, GAIA CLARA MERCEDES;
2013

Abstract

The use of microwave(MW) radiation to sinter metal oxide nanoparticles in plasma atmosphere has been successfully demonstrated for the production of p-type semiconductors to be utilized as photoactive materials in cathodic dye-sensitized solar cells (p-DSCs).[1] In particular, the preparation of NiO thin films[1,2] has been realized with this innovative method. In the adopted procedure NiO nanoparticles are first sprayed onto a transparent and conductive fluorine-doped indium oxide layer, and successively sintered at about 400 °C in plasma atmosphere for less than 10 mins with MW using a characteristic frequency of 2.45 GHz.[2] NiO layers with mesoporous morphology could be obtained via MW-sintering process as demonstrated by SEM and FIB images of NiO films with thickness in the range 0.6-15 µm. The electrochemical characterization of the NiO films thus prepared was conducted in aqueous and anhydrous electrolytes. The results were compared to those obtained with samples of compact NiO having comparable thickness. Successively the mesoporous NiO samples were sensitized with various organic/organometallic dyes, and tested in sealed cells with the redox couple I2/I-. The resulting p-DSCs displayed efficiencies of less than 0.2 % [3] when NiO cathode had an optimum thickness value comprised between 2 and 4 m. Studies about the photo-electrochemical behaviour of tandem DSCs based on MW-sintered NiO photocathodes and TiO2 photoanodes are in progress, and will constitute the content of another contribution.
2013
Giornate dell'Elettrochimica Italiana 2013
04 Pubblicazione in atti di convegno::04d Abstract in atti di convegno
CATHODIC DYE-SENSITIZED SOLAR CELLS WITH PHOTOACTIVE NIO ELECTRODES DEPOSITED VIA PLASMA ASSISTED MICROWAVE SINTERING / Dini, Danilo; Decker, Franco; Naponiello, GAIA CLARA MERCEDES; Dowling, Denis P.; Di Carlo, Aldo. - In: Atti del Convegno. - STAMPA. - (2013), pp. 38-38. (Intervento presentato al convegno Giornate dell'Elettrochimica Italiana 2013 tenutosi a Pavia nel 22-27 Settembre 2017).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/979547
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