In this study, we report on the feasibility of formation of nickel/tin solder pads and bus bars directly electroplated onto the aluminum screen-printed rear metallization layer of silicon-based solar cells. A localized wet processing technique via dynamic liquid drop/meniscus is used to perform the electrodeposition procedure. Excellent mechanical and electrical parameters of electroplated contacts are measured, thus proving the reliability of the proposed approach suitable for industrial application. Adhesion of electroplated nickel/tin solder pads is ensured through a two-step electrochemical pretreatment procedure, resulting in mean peel force values ranging from 2.5 to 3.8 N/mm. Electroplating of solder pads directly onto the screen-printed aluminum layer allows us to obtain a full homogeneous back surface field on the solar cell, resulting in an efficiency gain in 0.31-0.48%abs range. Furthermore, the proposed method completely removes the need for silver in the rear-side metallization layer of silicon-based solar cells.
Electroplated nickel/tin solder pads for rear metallization of solar cells / Kholostov, Konstantin; Serenelli, Luca; Izzi, Massimo; Tucci, Mario; Bernardi, Dario; Balucani, Marco. - In: IEEE JOURNAL OF PHOTOVOLTAICS. - ISSN 2156-3381. - STAMPA. - (2016), pp. 404-411. [10.1109/JPHOTOV.2015.2506408]
Electroplated nickel/tin solder pads for rear metallization of solar cells
KHOLOSTOV, KONSTANTIN;SERENELLI, LUCA;BALUCANI, Marco
2016
Abstract
In this study, we report on the feasibility of formation of nickel/tin solder pads and bus bars directly electroplated onto the aluminum screen-printed rear metallization layer of silicon-based solar cells. A localized wet processing technique via dynamic liquid drop/meniscus is used to perform the electrodeposition procedure. Excellent mechanical and electrical parameters of electroplated contacts are measured, thus proving the reliability of the proposed approach suitable for industrial application. Adhesion of electroplated nickel/tin solder pads is ensured through a two-step electrochemical pretreatment procedure, resulting in mean peel force values ranging from 2.5 to 3.8 N/mm. Electroplating of solder pads directly onto the screen-printed aluminum layer allows us to obtain a full homogeneous back surface field on the solar cell, resulting in an efficiency gain in 0.31-0.48%abs range. Furthermore, the proposed method completely removes the need for silver in the rear-side metallization layer of silicon-based solar cells.File | Dimensione | Formato | |
---|---|---|---|
Kholostov_postprint_Electroplated_2016.pdf
solo utenti autorizzati
Tipologia:
Documento in Post-print (versione successiva alla peer review e accettata per la pubblicazione)
Licenza:
Tutti i diritti riservati (All rights reserved)
Dimensione
4.09 MB
Formato
Adobe PDF
|
4.09 MB | Adobe PDF | Contatta l'autore |
Kkolostov_Electroplated_2016.pdf
solo gestori archivio
Tipologia:
Versione editoriale (versione pubblicata con il layout dell'editore)
Licenza:
Tutti i diritti riservati (All rights reserved)
Dimensione
609.21 kB
Formato
Adobe PDF
|
609.21 kB | Adobe PDF | Contatta l'autore |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.