In this paper, we present a device that minimizes the effects of the temperature on light detection in lab-on-chip systems. The device is based on hydrogenated amorphous silicon p-type/intrinsic/n-type junction, fabricated on a glass substrate using thin-film technologies. The device structure is constituted by two series-connected amorphous silicon diodes: a blind one acting as dark reference and a photosensitive one. The signal measured at the output node of each element is equal to the difference of the current of the two diodes. This allows to minimize the temperature-dependent dark current contribution. The design of the photolithographic masks has been carefully carried out to pursue a perfect technological symmetry between the two diodes of the differential structure. Experimental data obtained by current-voltage characteristics show the correct operation of the individual diodes as well as the effectiveness of the differential structure to reject the common-mode signal induced by temperature variations. This feature makes the device a suitable candidate for analytical systems based on optical detection that involve thermal treatments
Array of differential photodiodes for thermal effects minimization in biomolecular analysis / Carpentiero, Matteo; Caputo, Domenico; Gambino, Juri; Lovecchio, Nicola; DE CESARE, Giampiero; Nascetti, Augusto. - STAMPA. - (2015), pp. 17-20. (Intervento presentato al convegno 2015 6th IEEE International Workshop on Advances in Sensors and Interfaces, IWASI 2015 tenutosi a Gallipoli; Italy; nel 18- 19 June 2015-) [10.1109/IWASI.2015.7184941].
Array of differential photodiodes for thermal effects minimization in biomolecular analysis
CARPENTIERO, MATTEO;CAPUTO, Domenico;LOVECCHIO, NICOLA;DE CESARE, Giampiero;NASCETTI, Augusto
2015
Abstract
In this paper, we present a device that minimizes the effects of the temperature on light detection in lab-on-chip systems. The device is based on hydrogenated amorphous silicon p-type/intrinsic/n-type junction, fabricated on a glass substrate using thin-film technologies. The device structure is constituted by two series-connected amorphous silicon diodes: a blind one acting as dark reference and a photosensitive one. The signal measured at the output node of each element is equal to the difference of the current of the two diodes. This allows to minimize the temperature-dependent dark current contribution. The design of the photolithographic masks has been carefully carried out to pursue a perfect technological symmetry between the two diodes of the differential structure. Experimental data obtained by current-voltage characteristics show the correct operation of the individual diodes as well as the effectiveness of the differential structure to reject the common-mode signal induced by temperature variations. This feature makes the device a suitable candidate for analytical systems based on optical detection that involve thermal treatmentsFile | Dimensione | Formato | |
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