In this paper we focus our attention on compensated materials with μ-doping concentration in order to obtain a stable intrinsic layer with initial high photoconductivity suitable for p-i-n solar cells. Films were grown from a mixture of undiluted silane, hydrogen diluted phosphine and hydrogen diluted diborane. Values of dark conductivity around 10-11 Ω-1cm-1 and photosensitivity ratio under AM 1.5 of 6 orders of magnitude have been obtained for phosphine/diborane ratio around 102. The difference between the two dopant concentrations is in agreement with the difference in doping efficiency of the two gases found in the characterization of single μ-doped films. We compared the degradation behavior of compensated and intrinsic materials with the same initial dark and light conductivity. After about 20 h the photoconductivity of the compensated and the intrinsic material decreased of 33% and 70%, respectively. The space of investigable deposition parameters has been limited by the stress induced by the simultaneous presence of phosphine and diborane which leads to a macroscopic, periodic and regular damage of the film

Effect of μ-doped compensated material on stability of a-Si:H solar cells / Caputo, Domenico; DE CESARE, Giampiero; Palma, Fabrizio; Tucci, M.. - 420:(1996), pp. 27-32. (Intervento presentato al convegno Proceedings of the 1996 MRS Spring Symposium tenutosi a San Francisco, CA, USA, null nel 8-12 April 1996).

Effect of μ-doped compensated material on stability of a-Si:H solar cells

CAPUTO, Domenico;DE CESARE, Giampiero;PALMA, Fabrizio;
1996

Abstract

In this paper we focus our attention on compensated materials with μ-doping concentration in order to obtain a stable intrinsic layer with initial high photoconductivity suitable for p-i-n solar cells. Films were grown from a mixture of undiluted silane, hydrogen diluted phosphine and hydrogen diluted diborane. Values of dark conductivity around 10-11 Ω-1cm-1 and photosensitivity ratio under AM 1.5 of 6 orders of magnitude have been obtained for phosphine/diborane ratio around 102. The difference between the two dopant concentrations is in agreement with the difference in doping efficiency of the two gases found in the characterization of single μ-doped films. We compared the degradation behavior of compensated and intrinsic materials with the same initial dark and light conductivity. After about 20 h the photoconductivity of the compensated and the intrinsic material decreased of 33% and 70%, respectively. The space of investigable deposition parameters has been limited by the stress induced by the simultaneous presence of phosphine and diborane which leads to a macroscopic, periodic and regular damage of the film
1996
Proceedings of the 1996 MRS Spring Symposium
Electronic, Optical and Magnetic Materials
04 Pubblicazione in atti di convegno::04b Atto di convegno in volume
Effect of μ-doped compensated material on stability of a-Si:H solar cells / Caputo, Domenico; DE CESARE, Giampiero; Palma, Fabrizio; Tucci, M.. - 420:(1996), pp. 27-32. (Intervento presentato al convegno Proceedings of the 1996 MRS Spring Symposium tenutosi a San Francisco, CA, USA, null nel 8-12 April 1996).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/790154
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