Porous silicon was formed on multicrystalline Si substrates by stain etching in aqueous HF/HNO3 solutions. In this work optical and electrical properties of the resulting films are discussed as a function of process parameters. Porous-Si films have been shown to be able to reduce surface reflectance to 3% in 350-700 nm wavelength range and their application in anti-reflection coating of photovoltaic solar cells has been demonstrated, obtaining (10×10) cm2 multicrystalline Si solar cells with efficiency approaching 12% under standard AM 1.5 simulated sunlight.
porous silicon coatings for photovoltaic devices / Schirone, Luigi; Sotgiu, G.; Rallo, F.; Califano, F. P.. - In: NUOVO CIMENTO DELLA SOCIETÀ ITALIANA DI FISICA. D CONDENSED MATTER, ATOMIC, MOLECULAR AND CHEMICAL PHYSICS, BIOPHYSICS. - ISSN 0392-6737. - 18:(1996), pp. 1225-1232.
porous silicon coatings for photovoltaic devices
SCHIRONE, Luigi;
1996
Abstract
Porous silicon was formed on multicrystalline Si substrates by stain etching in aqueous HF/HNO3 solutions. In this work optical and electrical properties of the resulting films are discussed as a function of process parameters. Porous-Si films have been shown to be able to reduce surface reflectance to 3% in 350-700 nm wavelength range and their application in anti-reflection coating of photovoltaic solar cells has been demonstrated, obtaining (10×10) cm2 multicrystalline Si solar cells with efficiency approaching 12% under standard AM 1.5 simulated sunlight.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
