Features of the nickel electrochemical deposition into mesoporous silicon are discussed. The process was controlled by the surface potential of a sample relative to the reference Ag/Cl electrode. Complete pore filling with metal is reported. Cross-sectional SEM studies of the samples at various deposition stages allowed the deposition mechanism to be revealed.
Features of the nickel electrochemical deposition into mesoporous silicon / A., Dolgyi; Balucani, Marco. - (2009), p. 406. (Intervento presentato al convegno Nanomeeting 2009 tenutosi a Minsk; Russia nel Maggio 2009) [10.1142/9789814280365_0098].
Features of the nickel electrochemical deposition into mesoporous silicon
BALUCANI, Marco
2009
Abstract
Features of the nickel electrochemical deposition into mesoporous silicon are discussed. The process was controlled by the surface potential of a sample relative to the reference Ag/Cl electrode. Complete pore filling with metal is reported. Cross-sectional SEM studies of the samples at various deposition stages allowed the deposition mechanism to be revealed.File allegati a questo prodotto
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