The efficacy of the UV-H2O2 treatment to degrade the antibioticchloramphenicol (CHL) was investigated at 20°C using a low-pressure mercury lamp as UV source. A two-level factorial design was used to study the effects of initial CHL(c0 = 40-80 mg L-1) and H2O2(h0 = 20-50mM) concentrations, reaction time (t = 30-70 min) and irradiance level (I = 400-800 μW cm-2) on CHLdegradation. Under the best conditions (c0 = 40 mg L-1, h0 = 20 mM, t = 70 min, I = 800 μW cm-2), almost 96% of the antibiotic was degraded. No residual antibiotic activity was detected in the treated solution, thereby confirming the efficacy of the UV-H2O2 process. © (2013) Trans Tech Publications, Switzerland.

Chloramphenicol removal from wastewater by UV/H2O2 advanced oxidation process / Zuorro, Antonio; Lavecchia, Roberto. - STAMPA. - 800:(2013), pp. 565-568. (Intervento presentato al convegno 2013 International Conference on Application of Materials Science and Environmental Materials, AMSEM 2013 tenutosi a Zhangjia Jie nel 5 July 2013 through 7 July 2013) [10.4028/www.scientific.net/amr.800.565].

Chloramphenicol removal from wastewater by UV/H2O2 advanced oxidation process

ZUORRO, ANTONIO;LAVECCHIA, Roberto
2013

Abstract

The efficacy of the UV-H2O2 treatment to degrade the antibioticchloramphenicol (CHL) was investigated at 20°C using a low-pressure mercury lamp as UV source. A two-level factorial design was used to study the effects of initial CHL(c0 = 40-80 mg L-1) and H2O2(h0 = 20-50mM) concentrations, reaction time (t = 30-70 min) and irradiance level (I = 400-800 μW cm-2) on CHLdegradation. Under the best conditions (c0 = 40 mg L-1, h0 = 20 mM, t = 70 min, I = 800 μW cm-2), almost 96% of the antibiotic was degraded. No residual antibiotic activity was detected in the treated solution, thereby confirming the efficacy of the UV-H2O2 process. © (2013) Trans Tech Publications, Switzerland.
2013
advanced oxidation processes; antibiotic resistance; chloramphenicol; uv/h202; uv/h2o2; wastewater treatment
01 Pubblicazione su rivista::01a Articolo in rivista
Chloramphenicol removal from wastewater by UV/H2O2 advanced oxidation process / Zuorro, Antonio; Lavecchia, Roberto. - STAMPA. - 800:(2013), pp. 565-568. (Intervento presentato al convegno 2013 International Conference on Application of Materials Science and Environmental Materials, AMSEM 2013 tenutosi a Zhangjia Jie nel 5 July 2013 through 7 July 2013) [10.4028/www.scientific.net/amr.800.565].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/529677
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