Nickel nanowires have been formed by the stationary electrochemical deposition of nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature of the Ni deposit has been established as well as expansion of its lattice parameter in comparison with bulk nickel. Control of the potential of porous silicon during electrochemical deposition allows to determine the moment of complete filling of pore space with Ni. The maximum achieved filling factor was 67% of the pores. The pore dimensions have been found to define the length and the diameter of the Ni nanowires that have equaled to 10 um and 100-120 nm, respectively. ©The Electrochemical Society.

Electrochemical Deposition of Ni into Mesoporous Silicon / Alexey, Dolgyi; Hanna, Bandarenka; Serghej, Prischepa; Kazimir, Yanushkevich; Nenzi, Paolo; Balucani, Marco; Vitaly, Bondarenko. - In: ECS TRANSACTIONS. - ISSN 1938-5862. - ELETTRONICO. - 41:35(2012), pp. 111-118. (Intervento presentato al convegno Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures 2 - 220th ECS Meeting tenutosi a Boston, MA nel 9 October 2011 through 14 October 2011) [10.1149/1.3699385].

Electrochemical Deposition of Ni into Mesoporous Silicon

NENZI, Paolo;BALUCANI, Marco;
2012

Abstract

Nickel nanowires have been formed by the stationary electrochemical deposition of nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature of the Ni deposit has been established as well as expansion of its lattice parameter in comparison with bulk nickel. Control of the potential of porous silicon during electrochemical deposition allows to determine the moment of complete filling of pore space with Ni. The maximum achieved filling factor was 67% of the pores. The pore dimensions have been found to define the length and the diameter of the Ni nanowires that have equaled to 10 um and 100-120 nm, respectively. ©The Electrochemical Society.
2012
01 Pubblicazione su rivista::01a Articolo in rivista
Electrochemical Deposition of Ni into Mesoporous Silicon / Alexey, Dolgyi; Hanna, Bandarenka; Serghej, Prischepa; Kazimir, Yanushkevich; Nenzi, Paolo; Balucani, Marco; Vitaly, Bondarenko. - In: ECS TRANSACTIONS. - ISSN 1938-5862. - ELETTRONICO. - 41:35(2012), pp. 111-118. (Intervento presentato al convegno Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures 2 - 220th ECS Meeting tenutosi a Boston, MA nel 9 October 2011 through 14 October 2011) [10.1149/1.3699385].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/500949
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