A short report is given on the technique of photoelectrochemical etching. The basic principles and the existing literature on photoetching are reviewed. It appears that this technique has a number of applications in semiconductor characterization, in optics, in electronic devices fabrication and in solar energy conversion devices. Special attention is devoted to the photoelectrochemical etching processes of III-V compound semiconductors and experimental results of the etching of InP are reported. The micro-reliefs obtained on InP by photoetching are described and possible applications are discussed.
FROM PHOTOCORROSION TO PHOTOELECTROCHEMICAL ETCHING / Decker, Franco; D. A., Soltz; L., Cescato. - In: ELECTROCHIMICA ACTA. - ISSN 0013-4686. - 38:1(1993), pp. 95-99. (Intervento presentato al convegno SYMP ON NEW TRENDS IN PHOTOCHEMISTRY tenutosi a SICILY, ITALY nel SEP 23-25, 1991) [10.1016/0013-4686(93)80013-p].
FROM PHOTOCORROSION TO PHOTOELECTROCHEMICAL ETCHING
DECKER, Franco;
1993
Abstract
A short report is given on the technique of photoelectrochemical etching. The basic principles and the existing literature on photoetching are reviewed. It appears that this technique has a number of applications in semiconductor characterization, in optics, in electronic devices fabrication and in solar energy conversion devices. Special attention is devoted to the photoelectrochemical etching processes of III-V compound semiconductors and experimental results of the etching of InP are reported. The micro-reliefs obtained on InP by photoetching are described and possible applications are discussed.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
