A simple apparatus for measuring the thickness of thin metal films is described in which a new background correction method is applied to the X-ray fluorescence technique. This method provides film thickness measurements that are almost independent of the nature and the thickness of substrates with a low mean atomic number Z. Several test measurements were performed on gold and copper monolayers and on Au/Cu double layers. An improvement in the accuracy and in the minimum detectable limit was found.
Rapid and accurate measurement of the thickness of thin films by an X-ray Fluorescence technique using a new background subtraction method / Cirone, R.; Gigante, Giovanni Ettore; Gualtieri, G.; Picozzi, P.; Santucci, S.. - In: THIN SOLID FILMS. - ISSN 0040-6090. - STAMPA. - 88:1(1982), pp. 81-84. [10.1016/0040-6090(82)90353-4]
Rapid and accurate measurement of the thickness of thin films by an X-ray Fluorescence technique using a new background subtraction method
GIGANTE, Giovanni Ettore;
1982
Abstract
A simple apparatus for measuring the thickness of thin metal films is described in which a new background correction method is applied to the X-ray fluorescence technique. This method provides film thickness measurements that are almost independent of the nature and the thickness of substrates with a low mean atomic number Z. Several test measurements were performed on gold and copper monolayers and on Au/Cu double layers. An improvement in the accuracy and in the minimum detectable limit was found.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
