Mixed oxide films of transition metals gain considerable much attention due to their interesting optoelectronic properties. The low temperature chemical vapor growth processing of thin films of mixed W and Mo oxides is presented. The investigation is related to optimization of films structure and the related optoelectronic properties in dependence on the chemical vapor deposition (CVD) process parameters. Their electrochromic behavior and photoelectrode properties were studied.
Vapor growth of electrochromic thin films of transition metal oxides / K. A., Gesheva; T., Ivanova; B., Marsen; Zollo, Giuseppe; M., Kalitzova. - In: JOURNAL OF CRYSTAL GROWTH. - ISSN 0022-0248. - STAMPA. - 310:7-9(2008), pp. 2103-2109. (Intervento presentato al convegno 15th International Conference on Crystal Growth tenutosi a Salt Lake City, UT nel AUG 12-17, 2007) [10.1016/j.jcrysgro.2007.12.034].
Vapor growth of electrochromic thin films of transition metal oxides
ZOLLO, Giuseppe;
2008
Abstract
Mixed oxide films of transition metals gain considerable much attention due to their interesting optoelectronic properties. The low temperature chemical vapor growth processing of thin films of mixed W and Mo oxides is presented. The investigation is related to optimization of films structure and the related optoelectronic properties in dependence on the chemical vapor deposition (CVD) process parameters. Their electrochromic behavior and photoelectrode properties were studied.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
