Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 x 10(16) cm(-2) and 10(16) cm(-2), respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.
Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study / Zollo, Giuseppe; M., Kalitzova; D., Manno; G., Vitali. - In: JOURNAL OF PHYSICS D. APPLIED PHYSICS. - ISSN 0022-3727. - STAMPA. - 37:19(2004), pp. 2730-2736. [10.1088/0022-3727/37/19/018]
Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study
ZOLLO, Giuseppe;
2004
Abstract
Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 x 10(16) cm(-2) and 10(16) cm(-2), respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
