Bismuth adsorbed on Si(001) induces successive (2 x n) phases after annealing, with n ranging from 12 to 5. The structure consists of dimer rows, with missing-dimer defects forming and ordering in the perpendicular direction. We investigated by grazing-incidence X-ray diffraction the n = 6.45 surface, which results from missing-dimer line ordering each 6 or 7 units. The structural refinement is based either on a (2 x 6) or a (2 x 7) cell. The Bi dimers are lying at 1.86 Angstrom on top of Si, with a dimer bond length of 3.11 Angstrom. They are displaced along the row towards the missing dimer, while the Si atoms are at bulk positions. A photoemission study of the Bi 5d and Si 2p core levels confirms the model of symmetric Bi dimers, after breaking Si dimers, The diffracted intensity is calculated using the phase-matrix method. The positions and widths of the peaks are analysed in terms of the dimer blocks probability distribution. (C) 1999 Elsevier Science B.V. All rights reserved.

Structure and missing-dimer probability distribution of the (2 x n) Bi-induced Si(001) surface / N., Jedrecy; L., Gavioli; Mariani, Carlo; V., Corradini; Betti, Maria Grazia; B., Croset; C., De Beauvais. - In: SURFACE SCIENCE. - ISSN 0039-6028. - 433:(1999), pp. 367-372. (Intervento presentato al convegno 14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis tenutosi a BIRMINGHAM, ENGLAND nel AUG 31-SEP 04, 1998) [10.1016/s0039-6028(99)00108-9].

Structure and missing-dimer probability distribution of the (2 x n) Bi-induced Si(001) surface

MARIANI, CARLO;BETTI, Maria Grazia;
1999

Abstract

Bismuth adsorbed on Si(001) induces successive (2 x n) phases after annealing, with n ranging from 12 to 5. The structure consists of dimer rows, with missing-dimer defects forming and ordering in the perpendicular direction. We investigated by grazing-incidence X-ray diffraction the n = 6.45 surface, which results from missing-dimer line ordering each 6 or 7 units. The structural refinement is based either on a (2 x 6) or a (2 x 7) cell. The Bi dimers are lying at 1.86 Angstrom on top of Si, with a dimer bond length of 3.11 Angstrom. They are displaced along the row towards the missing dimer, while the Si atoms are at bulk positions. A photoemission study of the Bi 5d and Si 2p core levels confirms the model of symmetric Bi dimers, after breaking Si dimers, The diffracted intensity is calculated using the phase-matrix method. The positions and widths of the peaks are analysed in terms of the dimer blocks probability distribution. (C) 1999 Elsevier Science B.V. All rights reserved.
1999
bismuth; photoemission; silicon; surface structure; x-ray diffraction
01 Pubblicazione su rivista::01a Articolo in rivista
Structure and missing-dimer probability distribution of the (2 x n) Bi-induced Si(001) surface / N., Jedrecy; L., Gavioli; Mariani, Carlo; V., Corradini; Betti, Maria Grazia; B., Croset; C., De Beauvais. - In: SURFACE SCIENCE. - ISSN 0039-6028. - 433:(1999), pp. 367-372. (Intervento presentato al convegno 14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis tenutosi a BIRMINGHAM, ENGLAND nel AUG 31-SEP 04, 1998) [10.1016/s0039-6028(99)00108-9].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/256305
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