Annealing of a thin Bi layer grown on the Si(100)-(2 x 1) surface is known to produce well-ordered (2 x n) reconstructions. To investigate the Bi-induced electronic properties in these different structural configurations, we present ultraviolet photoemission and high-resolution electron energy loss spectroscopies on this interface. The adsorption of Bi produces clear modification of the substrate dimer-related surface states. On the (2 x n)-Bi reconstructed phases the data show a clear semiconducting behaviour, with the opening of a surface gap larger (1.3 eV) than that observed on the clean Si(100)-(2 x 1) surface (0.4 eV). Moreover, electronic states are detected within the gap up to 280 degrees C annealing temperature, whose possible origin is discussed. The absence of electronic excitations in the enlarged gap region and the modified density of occupied states observed for higher annealing temperatures (< 500 degrees C) suggest that the Bi adatoms induce breaking of the underlying Si-Si dimers.
Electronic properties of (2xn)-Bi reconstructions on Si(100) / L., Gavioli; Betti, Maria Grazia; Mariani, Carlo. - In: SURFACE SCIENCE. - ISSN 0039-6028. - 377:(1997), pp. 215-219. (Intervento presentato al convegno 16th European Conference on Surface Science tenutosi a GENOA, ITALY nel SEP 09-13, 1996) [10.1016/s0039-6028(96)01357-x].
Electronic properties of (2xn)-Bi reconstructions on Si(100)
BETTI, Maria Grazia;MARIANI, CARLO
1997
Abstract
Annealing of a thin Bi layer grown on the Si(100)-(2 x 1) surface is known to produce well-ordered (2 x n) reconstructions. To investigate the Bi-induced electronic properties in these different structural configurations, we present ultraviolet photoemission and high-resolution electron energy loss spectroscopies on this interface. The adsorption of Bi produces clear modification of the substrate dimer-related surface states. On the (2 x n)-Bi reconstructed phases the data show a clear semiconducting behaviour, with the opening of a surface gap larger (1.3 eV) than that observed on the clean Si(100)-(2 x 1) surface (0.4 eV). Moreover, electronic states are detected within the gap up to 280 degrees C annealing temperature, whose possible origin is discussed. The absence of electronic excitations in the enlarged gap region and the modified density of occupied states observed for higher annealing temperatures (< 500 degrees C) suggest that the Bi adatoms induce breaking of the underlying Si-Si dimers.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.