Quantum lithography proposes to adopt entangled quantum states in order to increase resolution in interferometry. In the present paper we experimentally demonstrate that the output of a high-gain optical parametric amplifier can be intense yet exhibits quantum features, namely, sub-Rayleigh fringes, as proposed by [Agarwal , Phys. Rev. Lett. 86, 1389 (2001)]. We investigate multiphoton states generated by a high-gain optical parametric amplifier operating with a quantum vacuum input for gain values up to 2.5. The visibility has then been increased by means of three-photon absorption. The present paper opens interesting perspectives for the implementation of such an advanced interferometrical setup.

Experimental sub-Rayleigh resolution by an unseeded high-gain optical parametric amplifier for quantum lithography / Sciarrino, Fabio; Vitelli, Chiara; DE MARTINI, Francesco; Ryan, Glasser; Cableh,. - In: PHYSICAL REVIEW A. - ISSN 1050-2947. - 77:1(2008), pp. 012324-1-012324-5. [10.1103/physreva.77.012324]

Experimental sub-Rayleigh resolution by an unseeded high-gain optical parametric amplifier for quantum lithography

SCIARRINO, Fabio;VITELLI, Chiara;DE MARTINI, Francesco;
2008

Abstract

Quantum lithography proposes to adopt entangled quantum states in order to increase resolution in interferometry. In the present paper we experimentally demonstrate that the output of a high-gain optical parametric amplifier can be intense yet exhibits quantum features, namely, sub-Rayleigh fringes, as proposed by [Agarwal , Phys. Rev. Lett. 86, 1389 (2001)]. We investigate multiphoton states generated by a high-gain optical parametric amplifier operating with a quantum vacuum input for gain values up to 2.5. The visibility has then been increased by means of three-photon absorption. The present paper opens interesting perspectives for the implementation of such an advanced interferometrical setup.
2008
01 Pubblicazione su rivista::01a Articolo in rivista
Experimental sub-Rayleigh resolution by an unseeded high-gain optical parametric amplifier for quantum lithography / Sciarrino, Fabio; Vitelli, Chiara; DE MARTINI, Francesco; Ryan, Glasser; Cableh,. - In: PHYSICAL REVIEW A. - ISSN 1050-2947. - 77:1(2008), pp. 012324-1-012324-5. [10.1103/physreva.77.012324]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/227799
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