Bandgap engineering on demand in GaAsN nanowires by post‐growth hydrogen implantation

Bandgap engineering in semiconductors is required for the development of photonic and optoelectronic devices with optimized absorption and emission energies. This is usually achieved by changing the chemical or structural composition during growth or by dynamically applying strain. Here, the bandgap in GaAsN nanowires grown on Si is increased post-growth by up to 460 meV in a reversible, tunable, and non-destructive manner through H implantation. Such a bandgap tunability is unattained in epilayers and enabled by relaxed strain requirements in nanowire heterostructures, which enables N concentrations of up to 4.2% in core–shell GaAs/GaAsN/GaAs nanowires resulting in a GaAsN bandgap as low as 0.97 eV. Using (Formula presented.) -photoluminescence measurements on individual nanowires, it is shown that the high bandgap energy of GaAs at 1.42 eV is restored by hydrogenation through the formation of N–H complexes. By carefully optimizing the hydrogenation conditions, the photoluminescence efficiency increases by an order of magnitude. Moreover, by controlled thermal annealing, the large shift of the bandgap is not only made reversible but also continuously tuned by breaking up N–H complexes in the hydrogenated GaAsN. Finally, local bandgap tuning by laser annealing is demonstrated, opening up new possibilities for developing novel, locally and energy-controlled quantum structures in GaAsN nanowires.