This paper presents a comprehensive study of hydrogenated amorphous silicon (a-Si)-based detectors, utilizing electrical characterization, Raman spectroscopy, photoemission, and inverse photoemission techniques. The unique properties of a-Si have sparked interest in its application for radiation detection in both physics and medicine. Although amorphous silicon (a-Si) is inherently a highly defective material, hydrogenation significantly reduces defect density, enabling its use in radiation detector devices. Spectroscopic measurements provide insights into the intricate relationship between the structure and electronic properties of a-Si, enhancing our understanding of how specific configurations, such as the choice of substrate, can markedly influence detector performance. In this study, we compare the performance of a-Si detectors deposited on two different substrates: crystalline silicon (c-Si) and flexible Kapton. Our findings suggest that detectors deposited on Kapton exhibit reduced sensitivity, despite having comparable noise and leakage current levels to those on crystalline silicon. We hypothesize that this discrepancy may be attributed to the substrate material, differences in film morphology, and/or the alignment of energy levels. Further measurements are planned to substantiate these hypotheses.

Mobility Gaps of Hydrogenated Amorphous Silicon Related to Hydrogen Concentration and Its Influence on Electrical Performance / Peverini, F.; Aziz, S.; Bashiri, A.; Bizzarri, M.; Boscardin, M.; Calcagnile, L.; Calcatelli, C.; Calvo, D.; Caponi, S.; Caprai, M.; Caputo, D.; Caricato, A. P.; Catalano, R.; Cirro, R.; Cirrone, G. A. P.; Crivellari, M.; Croci, T.; Cuttone, G.; de Cesare, G.; De Remigis, P.; Dunand, S.; Fabi, M.; Frontini, L.; Fano, L.; Gianfelici, B.; Grimani, C.; Hammad, O.; Ionica, M.; Kanxheri, K.; Large, M.; Lenta, F.; Liberali, V.; Lovecchio, N.; Martino, M.; Maruccio, G.; Mazza, G.; Menichelli, M.; Monteduro, A. G.; Moscatelli, F.; Morozzi, A.; Nascetti, A.; Pallotta, S.; Papi, A.; Passeri, D.; Petasecca, M.; Petringa, G.; Pis, I.; Placidi, P.; Quarta, G.; Rizzato, S.; Rossi, A.; Rossi, G.; Sabbatini, F.; Scorzoni, A.; Servoli, L.; Stabile, A.; Tacchi, S.; Talamonti, C.; Thomet, J.; Tosti, L.; Verzellesi, G.; Villani, M.; Wheadon, R. J.; Wyrsch, N.; Zema, N.; Pedio, M.. - In: NANOMATERIALS. - ISSN 2079-4991. - 14:19(2024). [10.3390/nano14191551]

Mobility Gaps of Hydrogenated Amorphous Silicon Related to Hydrogen Concentration and Its Influence on Electrical Performance

Caputo D.;de Cesare G.;Lovecchio N.;Nascetti A.;
2024

Abstract

This paper presents a comprehensive study of hydrogenated amorphous silicon (a-Si)-based detectors, utilizing electrical characterization, Raman spectroscopy, photoemission, and inverse photoemission techniques. The unique properties of a-Si have sparked interest in its application for radiation detection in both physics and medicine. Although amorphous silicon (a-Si) is inherently a highly defective material, hydrogenation significantly reduces defect density, enabling its use in radiation detector devices. Spectroscopic measurements provide insights into the intricate relationship between the structure and electronic properties of a-Si, enhancing our understanding of how specific configurations, such as the choice of substrate, can markedly influence detector performance. In this study, we compare the performance of a-Si detectors deposited on two different substrates: crystalline silicon (c-Si) and flexible Kapton. Our findings suggest that detectors deposited on Kapton exhibit reduced sensitivity, despite having comparable noise and leakage current levels to those on crystalline silicon. We hypothesize that this discrepancy may be attributed to the substrate material, differences in film morphology, and/or the alignment of energy levels. Further measurements are planned to substantiate these hypotheses.
2024
amorphous hydrogenated silicon; flexible substrate; hydrogen bonding; inverse photoemission; PECVD; photoemission; radiation detector; Raman; simulation; thin film
01 Pubblicazione su rivista::01a Articolo in rivista
Mobility Gaps of Hydrogenated Amorphous Silicon Related to Hydrogen Concentration and Its Influence on Electrical Performance / Peverini, F.; Aziz, S.; Bashiri, A.; Bizzarri, M.; Boscardin, M.; Calcagnile, L.; Calcatelli, C.; Calvo, D.; Caponi, S.; Caprai, M.; Caputo, D.; Caricato, A. P.; Catalano, R.; Cirro, R.; Cirrone, G. A. P.; Crivellari, M.; Croci, T.; Cuttone, G.; de Cesare, G.; De Remigis, P.; Dunand, S.; Fabi, M.; Frontini, L.; Fano, L.; Gianfelici, B.; Grimani, C.; Hammad, O.; Ionica, M.; Kanxheri, K.; Large, M.; Lenta, F.; Liberali, V.; Lovecchio, N.; Martino, M.; Maruccio, G.; Mazza, G.; Menichelli, M.; Monteduro, A. G.; Moscatelli, F.; Morozzi, A.; Nascetti, A.; Pallotta, S.; Papi, A.; Passeri, D.; Petasecca, M.; Petringa, G.; Pis, I.; Placidi, P.; Quarta, G.; Rizzato, S.; Rossi, A.; Rossi, G.; Sabbatini, F.; Scorzoni, A.; Servoli, L.; Stabile, A.; Tacchi, S.; Talamonti, C.; Thomet, J.; Tosti, L.; Verzellesi, G.; Villani, M.; Wheadon, R. J.; Wyrsch, N.; Zema, N.; Pedio, M.. - In: NANOMATERIALS. - ISSN 2079-4991. - 14:19(2024). [10.3390/nano14191551]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/1736109
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