Chalcogenide phase-change materials (PCMs) are showing versatile possibilities in cutting-edge applications, including non-volatile memory, neuromorphic computing, and nano-photonics. However, for embedded phase-change memory applications, conventional PCMs suffer from insufficient thermal stability because of their relatively low crystallization temperatures (T-x). Although doping with additional alloying elements could improve the amorphous stability, it also increases the tendency towards compositional partitioning and phase separation. Recently, a two-dimensional (2D) layered compound CrGeTe3 (CrGT) was developed as a PCM, showing a high T-x similar to 276 degrees C with an inverse change in resistive-switching character upon phase transition. Here, we report a high-throughput materials screening for 2D layered phase-change chalcogenides. We aim to clarify whether the high T-x and the inverse electrical resistance contrast are intrinsic features of 2D PCMs. In total, twenty-five 2D chalcogenides with CrGT trilayer structures have been identified from a large database. We then focused on selected layered tellurides by performing thorough ab initio simulations and experimental investigations and confirming that their amorphous phase indeed has a much higher T-x than conventional PCMs. We attribute this enhanced amorphous stability to the structurally complex nuclei required to render crystallization possible. Overall, we regard InGeTe3 as a balanced 2D PCM with both high thermal stability and large electrical contrast for embedded memory applications.

High-throughput screening to identify two-dimensional layered phase-change chalcogenides for embedded memory applications / Sun, Suyang; Wang, Xiaozhe; Jiang, Yihui; Lei, Yibo; Zhang, Siyu; Kumar, Sanjay; Zhang, Junying; Ma, En; Mazzarello, Riccardo; Wang, Jiang-Jing; Zhang, Wei. - In: NPJ COMPUTATIONAL MATERIALS. - ISSN 2057-3960. - 10:1(2024). [10.1038/s41524-024-01387-3]

High-throughput screening to identify two-dimensional layered phase-change chalcogenides for embedded memory applications

Mazzarello, Riccardo;
2024

Abstract

Chalcogenide phase-change materials (PCMs) are showing versatile possibilities in cutting-edge applications, including non-volatile memory, neuromorphic computing, and nano-photonics. However, for embedded phase-change memory applications, conventional PCMs suffer from insufficient thermal stability because of their relatively low crystallization temperatures (T-x). Although doping with additional alloying elements could improve the amorphous stability, it also increases the tendency towards compositional partitioning and phase separation. Recently, a two-dimensional (2D) layered compound CrGeTe3 (CrGT) was developed as a PCM, showing a high T-x similar to 276 degrees C with an inverse change in resistive-switching character upon phase transition. Here, we report a high-throughput materials screening for 2D layered phase-change chalcogenides. We aim to clarify whether the high T-x and the inverse electrical resistance contrast are intrinsic features of 2D PCMs. In total, twenty-five 2D chalcogenides with CrGT trilayer structures have been identified from a large database. We then focused on selected layered tellurides by performing thorough ab initio simulations and experimental investigations and confirming that their amorphous phase indeed has a much higher T-x than conventional PCMs. We attribute this enhanced amorphous stability to the structurally complex nuclei required to render crystallization possible. Overall, we regard InGeTe3 as a balanced 2D PCM with both high thermal stability and large electrical contrast for embedded memory applications.
2024
phase-change materials; embedded memories; two-dimensional materials
01 Pubblicazione su rivista::01a Articolo in rivista
High-throughput screening to identify two-dimensional layered phase-change chalcogenides for embedded memory applications / Sun, Suyang; Wang, Xiaozhe; Jiang, Yihui; Lei, Yibo; Zhang, Siyu; Kumar, Sanjay; Zhang, Junying; Ma, En; Mazzarello, Riccardo; Wang, Jiang-Jing; Zhang, Wei. - In: NPJ COMPUTATIONAL MATERIALS. - ISSN 2057-3960. - 10:1(2024). [10.1038/s41524-024-01387-3]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/1720675
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