In this work, we report on the fabrication and electrical characterization of junction field-effect transistors (JFETs) on flexible substrates for analogue electronics. The JFETs were realized using hydrogenated amorphous silicon (a-Si:H) as the semiconductor active material and a polyimide film as the flexible substrate. The devices were fabricated by using standard microelectronic technologies. The electrical characterization of the JFETs shows that the devices exhibit good performance in terms of output characteristics, making them suitable for the realization of low-power analog circuits.

Fabrication of junction field-effect transistors on a flexible substrate by using hydrogenated amorphous silicon / Lovecchio, N.; Caputo, D.; de Cesare, G.. - (2023), pp. 277-280. (Intervento presentato al convegno 9th IEEE International Workshop on Advances in Sensors and Interfaces, IWASI 2023 tenutosi a Monopoli; Italy) [10.1109/IWASI58316.2023.10164389].

Fabrication of junction field-effect transistors on a flexible substrate by using hydrogenated amorphous silicon

Lovecchio N.
;
Caputo D.;de Cesare G.
2023

Abstract

In this work, we report on the fabrication and electrical characterization of junction field-effect transistors (JFETs) on flexible substrates for analogue electronics. The JFETs were realized using hydrogenated amorphous silicon (a-Si:H) as the semiconductor active material and a polyimide film as the flexible substrate. The devices were fabricated by using standard microelectronic technologies. The electrical characterization of the JFETs shows that the devices exhibit good performance in terms of output characteristics, making them suitable for the realization of low-power analog circuits.
2023
9th IEEE International Workshop on Advances in Sensors and Interfaces, IWASI 2023
amorphous silicon films; analogue electronics on flexible substrates; flexible electronics; thin-film junction field effect transistors
04 Pubblicazione in atti di convegno::04b Atto di convegno in volume
Fabrication of junction field-effect transistors on a flexible substrate by using hydrogenated amorphous silicon / Lovecchio, N.; Caputo, D.; de Cesare, G.. - (2023), pp. 277-280. (Intervento presentato al convegno 9th IEEE International Workshop on Advances in Sensors and Interfaces, IWASI 2023 tenutosi a Monopoli; Italy) [10.1109/IWASI58316.2023.10164389].
File allegati a questo prodotto
File Dimensione Formato  
Lovecchio_Fabrication_2023.pdf

solo gestori archivio

Tipologia: Versione editoriale (versione pubblicata con il layout dell'editore)
Licenza: Tutti i diritti riservati (All rights reserved)
Dimensione 1.14 MB
Formato Adobe PDF
1.14 MB Adobe PDF   Contatta l'autore

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/1695714
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 1
  • ???jsp.display-item.citation.isi??? 1
social impact