This paper reports the synthesis and structure of a dipolar nonlinear optical bis(salicyladiminato)Ni(II) derived Schiff base complex, chemisorbed on H-terminated Si(100) surfaces. The existence of a monolayer of the derived complex, chemisorbed on the Si(100) surface is unambiguously confirmed by high resolution core-level XPS and AFM/SNOM analyses. The comparison between the optical SNOM images high-lights the contribution of the monolayer to the local reflectivity of the sample. Angle-resolved XPS data indicate the presence of chlorine head-atoms on the monolayer surface. Altogether, XPS and AFM/SNOM data suggest the formation of a homogeneous, complete, and ordered monolayer self-assembled on the Si(100) surface.
Bis(salicyladiminao)Ni(II) Schiff base complexes, grafted on H-terminated Si(100) surfaces, observed by Scanning Near-field Optical/Atomic Force Microscopy (SNOM/AFM) / Ustione, A; Cricenti, A; Condorelli, G. G.; Motta, A; DI BELLA, S. - In: PHYSICA STATUS SOLIDI C. - ISSN 1610-1634. - 12:(2005), pp. 4093-4096. [10.1002/pssc.200562202]
Bis(salicyladiminao)Ni(II) Schiff base complexes, grafted on H-terminated Si(100) surfaces, observed by Scanning Near-field Optical/Atomic Force Microscopy (SNOM/AFM)
MOTTA APenultimo
;
2005
Abstract
This paper reports the synthesis and structure of a dipolar nonlinear optical bis(salicyladiminato)Ni(II) derived Schiff base complex, chemisorbed on H-terminated Si(100) surfaces. The existence of a monolayer of the derived complex, chemisorbed on the Si(100) surface is unambiguously confirmed by high resolution core-level XPS and AFM/SNOM analyses. The comparison between the optical SNOM images high-lights the contribution of the monolayer to the local reflectivity of the sample. Angle-resolved XPS data indicate the presence of chlorine head-atoms on the monolayer surface. Altogether, XPS and AFM/SNOM data suggest the formation of a homogeneous, complete, and ordered monolayer self-assembled on the Si(100) surface.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.