Thin films of barium fluorides with different thicknesses were deposited on GaAs substrate by electron beam evaporation. The aim of the work was to identify the best growth conditions for the production of coatings with a low work function suitable for the anode of hybrid thermionic-photovoltaic (TIPV) devices. The chemical composition and work function φ of the films with different thicknesses were investigated by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). The lowest value of φ = 2.1 eV was obtained for the film with a thickness of ~2 nm. In the valence band spectra of the films at low kinetic energy, near the cutoff, a characteristic peak of negative electron affinity was present. This effect contributed to a further reduction of the film's work function.

Work function and negative electron affinity of ultrathin barium fluoride films / Mezzi, A.; Bolli, E.; Kaciulis, S.; Mastellone, M.; Girolami, M.; Serpente, V.; Bellucci, A.; Carducci, R.; Polini, R.; Trucchi, D. M.. - In: SURFACE AND INTERFACE ANALYSIS. - ISSN 0142-2421. - 52:12(2020), pp. 968-974. [10.1002/sia.6832]

Work function and negative electron affinity of ultrathin barium fluoride films

Mastellone M.;
2020

Abstract

Thin films of barium fluorides with different thicknesses were deposited on GaAs substrate by electron beam evaporation. The aim of the work was to identify the best growth conditions for the production of coatings with a low work function suitable for the anode of hybrid thermionic-photovoltaic (TIPV) devices. The chemical composition and work function φ of the films with different thicknesses were investigated by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). The lowest value of φ = 2.1 eV was obtained for the film with a thickness of ~2 nm. In the valence band spectra of the films at low kinetic energy, near the cutoff, a characteristic peak of negative electron affinity was present. This effect contributed to a further reduction of the film's work function.
barium fluorides; negative electron affinity; ups; work function; xps
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Work function and negative electron affinity of ultrathin barium fluoride films / Mezzi, A.; Bolli, E.; Kaciulis, S.; Mastellone, M.; Girolami, M.; Serpente, V.; Bellucci, A.; Carducci, R.; Polini, R.; Trucchi, D. M.. - In: SURFACE AND INTERFACE ANALYSIS. - ISSN 0142-2421. - 52:12(2020), pp. 968-974. [10.1002/sia.6832]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/1493564
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