Evaluation of the actual hardness of thin films was performed. The method is based on measurements of the hardness value in the composite system film/substrate and following isolation of the film hardness using the rule of mixts. over the surface and with allowance for size effect of indentation. Expts. were performed using thin (200-530 nm) carbide films of V, Zr, Hf, and Ta formed on Ti substrate using electron beam deposition. Correct ranging of indenter loads provides the results close to the hardness values obtained for corresponding compact ceramic materials.
Hardness determination in submicron films of refractory carbides on titanium / BARINOV S., M; Ferro, Daniela; RAU J., V; Latini, Alessandro. - In: ZAVODSKAÂ LABORATORIÂ. DIAGNOSTIKA MATERIALOV. - ISSN 1028-6861. - 73:(2007), pp. 51-54.
Hardness determination in submicron films of refractory carbides on titanium.
FERRO, DANIELA;LATINI, ALESSANDRO
2007
Abstract
Evaluation of the actual hardness of thin films was performed. The method is based on measurements of the hardness value in the composite system film/substrate and following isolation of the film hardness using the rule of mixts. over the surface and with allowance for size effect of indentation. Expts. were performed using thin (200-530 nm) carbide films of V, Zr, Hf, and Ta formed on Ti substrate using electron beam deposition. Correct ranging of indenter loads provides the results close to the hardness values obtained for corresponding compact ceramic materials.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
