Femtosecond laser and reactive ion etching based treatments for nanoscale surface texturing of porous silicon carbide

With the aim of tuning the optical properties of , we investigate the surface micro/nano-texturing of porous silicon carbide by using two approaches, namely i) the femtosecond laser treatment and ii) the fluorine based reactive ion etching. It is found that both the techniques are capable of inducing significant surface morphology modification inducing a substantial roughening. The surface features produced are found to be tunable by tailoring the main process parameters, i.e. translation speed and pulse repetition rate for laser treatment, and RF-power, gas pressure and gas mixture for the reactive ion etching process.