We report a synchrotron-radiation-excited photoemission study of the adsorption of W(CO)6 on Si(111)2 x 1. W(CO)6 is shown to adsorb molecularly on Si at 100 K, and to undergo dissociation at room temperature (RT). Exposure of a reacted surface at 100 K to unmonochromatized synchrotron light results in the formation of a metal layer on Si. Such a metal layer is stable during RT annealing.

Synchrotron-radiation stimulated tungsten deposition on silicon fron W(CO)6 / Zanoni, Robertino; M. N., Piancastelli; M., Marsi; G., Margaritondo. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - 9:3(1991), pp. 931-934. (Intervento presentato al convegno 37TH NATIONAL SYMP OF THE AMERICAN VACUUM SOC tenutosi a TORONTO, CANADA nel OCT 08-12, 1990) [10.1116/1.577551].

Synchrotron-radiation stimulated tungsten deposition on silicon fron W(CO)6

ZANONI, Robertino;
1991

Abstract

We report a synchrotron-radiation-excited photoemission study of the adsorption of W(CO)6 on Si(111)2 x 1. W(CO)6 is shown to adsorb molecularly on Si at 100 K, and to undergo dissociation at room temperature (RT). Exposure of a reacted surface at 100 K to unmonochromatized synchrotron light results in the formation of a metal layer on Si. Such a metal layer is stable during RT annealing.
1991
01 Pubblicazione su rivista::01a Articolo in rivista
Synchrotron-radiation stimulated tungsten deposition on silicon fron W(CO)6 / Zanoni, Robertino; M. N., Piancastelli; M., Marsi; G., Margaritondo. - In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A. VACUUM, SURFACES, AND FILMS. - ISSN 0734-2101. - 9:3(1991), pp. 931-934. (Intervento presentato al convegno 37TH NATIONAL SYMP OF THE AMERICAN VACUUM SOC tenutosi a TORONTO, CANADA nel OCT 08-12, 1990) [10.1116/1.577551].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/78435
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