Eye movements and blinks may produce unusual voltage changes that propagates from the eyeball through the head as volume conductor up to the scalp electrodes, generating severe electroencephalographic artifacts. Several methods are now available to correct the distortion Induced by these events on the EEG, having different advantages and drawbacks. The main focus of this work is to quantify the performance of the removal of EOG artifact due to the application of the independent component analysis (ICA) methodology. The precise quantification of the effects of artifact removal by ICA is possible by using a simulation setup, with a realistic head model, that it is able to mimic the occurrence of an eye blink. The electrical activity generated by the simulated eyeblink were propagated through the realistic head model and superimposed to a clean segment of EEG. Then, artifact removal was performed by using the ICA approach. Ocular artifact removal was evaluated in different operative conditions, characterized by different Signal to Noise Ratio and number of electrodes. The error measures used were the Relative Error and the Correlation Coefficient between the clear, original EEG segment and those obtained after the application of the ICA procedure. © 2006 IEEE.

Removal of ocular artifacts for high resolution EEG studies: A simulation study / Astolfi, Laura; Cincotti, Febo; Donatella, Mattia; Babiloni, Fabio; Maria Grazia, Marciani; DE VICO FALLANI, Fabrizio; Marco, Mattiocco; Fumikazu, Miwakeichi; Yoko, Yamaguchi; Pablo, Martinez; Salinari, Serenella; Andrea, Tocci; Hovagim, Bakardjian; Francois Benoit, Vialatte; Andrzej, Cichocki. - 1:(2006), pp. 976-979. (Intervento presentato al convegno 28th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBS'06 tenutosi a New York, NY nel 30 August 2006 through 3 September 2006) [10.1109/iembs.2006.260593].

Removal of ocular artifacts for high resolution EEG studies: A simulation study

ASTOLFI, LAURA;CINCOTTI, FEBO;BABILONI, Fabio;DE VICO FALLANI, FABRIZIO;SALINARI, Serenella;
2006

Abstract

Eye movements and blinks may produce unusual voltage changes that propagates from the eyeball through the head as volume conductor up to the scalp electrodes, generating severe electroencephalographic artifacts. Several methods are now available to correct the distortion Induced by these events on the EEG, having different advantages and drawbacks. The main focus of this work is to quantify the performance of the removal of EOG artifact due to the application of the independent component analysis (ICA) methodology. The precise quantification of the effects of artifact removal by ICA is possible by using a simulation setup, with a realistic head model, that it is able to mimic the occurrence of an eye blink. The electrical activity generated by the simulated eyeblink were propagated through the realistic head model and superimposed to a clean segment of EEG. Then, artifact removal was performed by using the ICA approach. Ocular artifact removal was evaluated in different operative conditions, characterized by different Signal to Noise Ratio and number of electrodes. The error measures used were the Relative Error and the Correlation Coefficient between the clear, original EEG segment and those obtained after the application of the ICA procedure. © 2006 IEEE.
2006
28th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBS'06
eeg; eog; high resolution eeg; ica; realistic head model
04 Pubblicazione in atti di convegno::04b Atto di convegno in volume
Removal of ocular artifacts for high resolution EEG studies: A simulation study / Astolfi, Laura; Cincotti, Febo; Donatella, Mattia; Babiloni, Fabio; Maria Grazia, Marciani; DE VICO FALLANI, Fabrizio; Marco, Mattiocco; Fumikazu, Miwakeichi; Yoko, Yamaguchi; Pablo, Martinez; Salinari, Serenella; Andrea, Tocci; Hovagim, Bakardjian; Francois Benoit, Vialatte; Andrzej, Cichocki. - 1:(2006), pp. 976-979. (Intervento presentato al convegno 28th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, EMBS'06 tenutosi a New York, NY nel 30 August 2006 through 3 September 2006) [10.1109/iembs.2006.260593].
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