Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 x 10(16) cm(-2) and 10(16) cm(-2), respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.

Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study / Zollo, Giuseppe; M., Kalitzova; D., Manno; G., Vitali. - In: JOURNAL OF PHYSICS D. APPLIED PHYSICS. - ISSN 0022-3727. - STAMPA. - 37:19(2004), pp. 2730-2736. [10.1088/0022-3727/37/19/018]

Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study

ZOLLO, Giuseppe;
2004

Abstract

Nano-sized precipitation in high-dose implanted Si has been investigated using high-resolution transmission electron microscopy of cross-sectional specimens (XHRTEM). Zn and Bi (50 keV) have been implanted in Si at doses of 5 x 10(16) cm(-2) and 10(16) cm(-2), respectively. In spite of the different diffusivities of these species in Si, their low solubility resulted in precipitation of nano-sized metallic inclusions whose inner structures revealed a synthesis of superlattices, composed of the host Si matrix and the implanted species.
2004
electron microscopy; ion implantation; nanocrystalline materials
01 Pubblicazione su rivista::01a Articolo in rivista
Precipitation of superstructured nano-crystals in high-dose implanted Si: an XHRTEM study / Zollo, Giuseppe; M., Kalitzova; D., Manno; G., Vitali. - In: JOURNAL OF PHYSICS D. APPLIED PHYSICS. - ISSN 0022-3727. - STAMPA. - 37:19(2004), pp. 2730-2736. [10.1088/0022-3727/37/19/018]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11573/37817
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