In this work we report on the characterisation of multimode rectangular ridge waveguides fabricated by Plasma Enhanced Chemical Vapor Deposition and anisotropic etching using different cores, consisting of hydrogenated amorphous silicon and amorphous silicon nitride. The propagation losses have been measured at several wavelengths by an end-fire coupling setup and compared to intrinsic absorption of the core materials. Two-dimensional photonic crystal structures have been carved onto the channel waveguides by Focused Ion Beam lithography demonstrating the possibility to fabricate complex optical elements merging the consolidated amorphous silicon growth technology with ion-beam nanomachining. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.
Amorphous silicon and silicon nitride channel optical waveguides / Edvige, Celasco; Marzia, Quaglio; Angelica, Chiodoni; Carlo, Ricciardi; Candido Fabrizio, Pirri; Dominici, Lorenzo; Michelotti, Francesco; F., De Angelis; E., Di Fabrizio; Fabrizio, Giorgis. - In: PHYSICA STATUS SOLIDI. C, CURRENT TOPICS IN SOLID STATE PHYSICS. - ISSN 1862-6351. - STAMPA. - 7:3-4(2010), pp. 836-839. (Intervento presentato al convegno 23rd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS23 tenutosi a Utrecht nel 23 August 2009 through 28 August 2009) [10.1002/pssc.200982681].
Amorphous silicon and silicon nitride channel optical waveguides
DOMINICI, Lorenzo;MICHELOTTI, Francesco;
2010
Abstract
In this work we report on the characterisation of multimode rectangular ridge waveguides fabricated by Plasma Enhanced Chemical Vapor Deposition and anisotropic etching using different cores, consisting of hydrogenated amorphous silicon and amorphous silicon nitride. The propagation losses have been measured at several wavelengths by an end-fire coupling setup and compared to intrinsic absorption of the core materials. Two-dimensional photonic crystal structures have been carved onto the channel waveguides by Focused Ion Beam lithography demonstrating the possibility to fabricate complex optical elements merging the consolidated amorphous silicon growth technology with ion-beam nanomachining. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
